TY  - GEN
AU  - May, Gary S.
AU  - Sze, Simon M.,
TI  - Fundamentals of semiconductor fabrication
SN  - 0471232793
AV  - TK7871.85 .M39 2004
PY  - 2004///
CY  - New York
PB  - Wiley
KW  - Yarı iletkenler
KW  - Tasarım ve yapım
KW  - Semiconductors
KW  - Design and construction
N1  - Includes index; Ch.1; Ch.2; Ch.3.Silicon Oxidation--; Ch.4; Ch.5; Ch.6; Ch.7.t; Ch.8; Ch.9; Ch.10; Ch.11; Introduction--; Crystal Growth--; Photolithography--; Etching--; Diffusion--; Film Deposition--; Process Integration--; IC Manufacturing--; Future Trends and Challenges App. B International System of Units (SI Units) App. C Unit Prefixes App. D Greek Alphabet App. E Physical Constants App. F Properties of Si and GaAs at 300 K App. G Some Properties of the Error Function App. H Basic Kinetic Theory of Gases App. I SUPREM Commands App. J Running PROLITH App. K Percentage Points of the t Distribution App. L Percentage Points of the F Distribution
ER  -