000 01120 a2200313 4500
001 10390
999 _c10390
_d375
003 TR-AnTOB
005 20200403121419.0
008 990216s1999 nyua 001 0 eng
010 _a99014252
020 _a0471534781 (alk. paper)
040 _aDLC
_cDLC
_dDLC
041 _aeng
050 0 _aTP155.7
_b.F44 1999
090 _aTP155.7 .F44 1999
100 _aFelder, Richard M.,
_d1939-
_91150
245 0 _aElementary principles of chemical processes /
_cRichard M. Felder, Ronald W. Rousseau.
250 _a3rd ed.
264 1 _aNew York :
_bJohn Wiley,
_c1999.
300 _axxvi, 675 p. :
_bill. ;
_c26 cm. +
_e1 computer laser optical disc (4 3/4 in.)
504 _aIncludes index.
650 _aChemical processes
_990
700 _aRousseau, Ronald W.,
_d1943-
_91151
856 4 _uhttp://www.loc.gov/catdir/bios/wiley041/99014252.html
_3Contributor biographical information
856 4 _uhttp://www.loc.gov/catdir/description/wiley032/99014252.html
_3Publisher description
856 4 _uhttp://www.loc.gov/catdir/toc/onix03/99014252.html
_3Table of Contents
942 _cBK