Fundamentals of semiconductor fabrication / Gary S. May, Simon M. Sze.
Language: İngilizce Publisher: New York: Wiley, c2004Description: xiii, 305 p. : ill. ; 26 cmISBN:- 0471232793
- TK7871.85 .M39 2004
Item type | Current library | Home library | Collection | Call number | Vol info | Copy number | Status | Date due | Barcode | |
---|---|---|---|---|---|---|---|---|---|---|
Book | Merkez Kütüphane Genel Koleksiyon / Main Collection | Merkez Kütüphane | Genel Koleksiyon | TK7871.85 .M39 2004 (Browse shelf(Opens below)) | 1 | 1 | Available | 0027705 |
Ch.1. Ch.2. Ch.3.Silicon Oxidation-- Ch.4. Ch.5. Ch.6 Ch.7.t Ch.8. Ch.9. Ch.10. Ch.11. Introduction-- Crystal Growth-- Photolithography-- Etching-- Diffusion-- Film Deposition-- Process Integration-- IC Manufacturing-- Future Trends and Challenges App. B International System of Units (SI Units) App. C Unit Prefixes App. D Greek Alphabet App. E Physical Constants App. F Properties of Si and GaAs at 300 K App. G Some Properties of the Error Function App. H Basic Kinetic Theory of Gases App. I SUPREM Commands App. J Running PROLITH App. K Percentage Points of the t Distribution App. L Percentage Points of the F Distribution
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